Machine Learning-Based Modelling in ALD by Oluwatobi Adeleke (.PDF)

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Machine Learning-Based Modelling in Atomic Layer Deposition Processes by Oluwatobi Adeleke, Tien-Chien Jen, Sina Karimzadeh
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Overview: While thin film technology has benefited greatly from artificial intelligence (AI) and machine learning (ML) techniques, there is still much to be learned from a full-scale exploration of these technologies in atomic layer deposition (ALD). This book provides in-depth information regarding the application of ML-based modeling techniques in thin film technology as a standalone approach and integrated with the classical simulation and modeling methods. It is the first of its kind to present detailed information regarding approaches in ML-based modeling, optimization, and prediction of the behaviors and characteristics of ALD for improved process quality control and discovery of new materials. As such, this book fills significant knowledge gaps in the existing resources as it provides extensive information on ML and its applications in film thin technology. Explores the application of key techniques in ML, such as predictive analysis, classification techniques, feature engineering, image processing capability, and microstructural analysis of Deep Learning algorithms and generative model benefits in ALD.
Genre: Non-Fiction > Tech & Devices

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