Ion Implantation and Annealing Applications by Wilfried Lerch (.PDF)
File Size: 71 MB
Ion Implantation and Annealing Applications, Science and Technology by Wilfried Lerch, Michael Current
Requirements: .PDF reader, 71 MB
Overview: This book compiles the insights and teachings from the 2024 IIT School lectures, offering a comprehensive look at ion implantation and annealing in semiconductor manufacturing. It covers the history of integrated circuits, common applications in CMOS technology, ion sources, radiation damage, annealing of materials like silicon (Si), silicon carbide (SiC) and gallium nitride (GaN), and advances in cluster ion beam technology. This edition, enriched by expert contributions, serves as an essential reference for students and professionals in materials science and microelectronics.
Genre: Non-Fiction > Educational
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